From the Noise: Measuring Atomic Structure in Amorphous Thin Films Grown by Atomic Layer Deposition

The ability to successfully translate ALD coatings to applications is impaired by limited understanding of process-structure-property relationships for nanoscale ALD films‚ and especially by a lack of understanding of the structure of these films at an atomic or molecular level.…

0
(0)

The ability to successfully translate ALD coatings to applications is impaired by limited understanding of process-structure-property relationships for nanoscale ALD films‚ and especially by a lack of understanding of the structure of these films at an atomic or molecular level. Single-crystal materials are only rarely achieved by ALD. More often‚ ALD films form amorphous‚ polycrystalline‚ or defective structures. ALD process conditions such as precursor selection(s)‚ precursor exposure(s)‚ and reactor temperature are known to impact the properties of ALD films. The substrate also affects the properties of ALD films‚ especially for ultrathin film thicknesses. To date‚ the ALD community has had difficulty connecting the atomic-scale structure of ALD films with their performance‚ largely because of limited availability of techniques to determine the atomic-scale structure of ultrathin ALD films. In this talk‚ we summarize recent work and report new results employing high energy X-ray diffraction and electron diffraction‚ both coupled with pair distribution function analysis and Reverse Monte Carlo modeling‚ to reveal new understanding of the atomic structure of ALD films. The techniques we discuss can be applied broadly to understand the local structure of ALD films‚ including low-Z and amorphous films‚ and help tailor ALD coatings for a range of applications of emerging interest.
***** Presented at the American Vacuum Society/Atomic Layer Deposition AVS/ALD 2020 Conference – AF-TuA07*****

0 / 5. 0

Leave a Reply

Your email address will not be published. Required fields are marked *